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US Patent Issued to SST on Oct. 20 for "High frequency reaction processing apparatus and high frequency reaction processing system" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,830, issued on Oct. 20, was assigned to SST INC. (Chiba, Japan). "High frequency reaction processing apparatus and high frequency reaction ... Read More


US Patent Issued to NISSIN ION EQUIPMENT on Oct. 20 for "Ion source and operating method thereof" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,831, issued on Oct. 20, was assigned to NISSIN ION EQUIPMENT Co. LTD. (Koka-city, Japan). "Ion source and operating method thereof" was inv... Read More


US Patent Issued to Lam Research on Oct. 20 for "Multi-location gas injection to improve uniformity in rapid alternating processes" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,832, issued on Oct. 20, was assigned to Lam Research Corp. (Fremont, Calif.). "Multi-location gas injection to improve uniformity in rapid ... Read More


US Patent Issued to Applied Materials on Oct. 20 for "Plasma chamber with a multiphase rotating gas cross-flow and peripheral conductance control rings" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,833, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Plasma chamber with a multiphase rotating gas cross-... Read More


US Patent Issued to ASM IP Holding on Oct. 20 for "Plasma enhanced epitaxial chemical vapor deposition system" (Arizona Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,834, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Plasma enhanced epitaxial chemical vapor deposition sys... Read More


US Patent Issued to Lam Research on Oct. 20 for "Coated part for plasma processing chamber" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,835, issued on Oct. 20, was assigned to Lam Research Corp. (Fremont, Calif.). "Coated part for plasma processing chamber" was invented by L... Read More


US Patent Issued to SEMES on Oct. 20 for "Apparatus for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,836, issued on Oct. 20, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea). "Apparatus for treating substrate" was invented by... Read More


US Patent Issued to NGK INSULATORS on Oct. 20 for "Focus ring placement table" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,837, issued on Oct. 20, was assigned to NGK INSULATORS Ltd. (Nagoya-City, Japan). "Focus ring placement table" was invented by Seiya Inoue ... Read More


US Patent Issued to Applied Materials on Oct. 20 for "Liner and edge ring to prevent gas diffusion" (Indian, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,838, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Liner and edge ring to prevent gas diffusion" was in... Read More


US Patent Issued to Lam Research on Oct. 20 for "Multi-station processing tools with station-varying support features for backside processing" (Oregon Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,839, issued on Oct. 20, was assigned to Lam Research Corp. (Fremont, Calif.). "Multi-station processing tools with station-varying support ... Read More